A Raster Multibeam Lithography Tool for Sub 100nm Mask Fabrication Utilizing a Novel Photocathode

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5220, Issue , 2003, Pages 46-51

  Maldonado, J R ^a   Coyle, S T ^a   Shamoun, B ^a   Yu, M ^a   Thomas, T ^b   Holmgren, D ^c   Chen, X ^c   DeVore, B ^a   Scheinfein, M R ^d   Gesley, M ^a  

^a Etec Systems   (United States)

^b TKD Inc   (United States)

^c Etec Systems   (United States)

^d SIMON FRASER UNIVERSITY   (Canada)

Author keywords

e beam; Electron beam lithography; Mask fabrication; Multi electron beam; Photocathode; Raster multibeam

Indexed keywords

ACOUSTOOPTICAL EFFECTS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; FABRICATION; LASER BEAMS; PHOTOCATHODES; SEMICONDUCTOR MATERIALS; SILICON WAFERS;

E-BEAMS; MASK FABRICATION; MULTI ELECTRON BEAM; RASTER MULTIBEAM;

MASKS;

EID: 10744233166     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.512863     Document Type: Conference Paper

References (6)

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6. Paper presented at the EIPBN 2003, Tampa., FLA on May 29, 2003. To be published in J. Vac. Sci. Technol. Dec. 2003.