Nano-optical elements fabricated by e-beam and x-ray lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5225, Issue , 2003, Pages 113-125

  Di Fabrizio, Enzo ^a   Cojoc, Dan ^a,d   Cabrini, Stefano ^a   Businaro, Luca ^e   Altissimo, Matteo ^a   Vaccari, Lisa ^e   Romanato, Filippo ^a   Malureanu, Radu ^a   Kaulich, Burkhard ^a   Wilhein, Thomas ^b   Susini, Jean ^c  

^a SINCROTRONE TRIESTE   (Italy)

^b UNIVERSITY OF APPLIED SCIENCES   (Germany)

^c EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^d UNIVERSITY POLITEHNICA OF BUCHAREST   (Romania)

^e Research Center for Optoelectronics ^*

Author keywords

Diffractive optical elements; e beam lithography; X ray lithography; X ray microscopy; Zone plates

Indexed keywords

ALGORITHMS; COMPUTER SIMULATION; DIFFRACTION; ELECTRON BEAM LITHOGRAPHY; LIGHT POLARIZATION; NANOSTRUCTURED MATERIALS; OPTICAL RESOLVING POWER; SCANNING ELECTRON MICROSCOPY; SYNCHROTRON RADIATION; X RAY LITHOGRAPHY;

DIFFRACTIVE OPTICAL ELEMENTS (DOE); X-RAY MICROSCOPY; ZONE PLATES (ZP);

OPTICAL DEVICES;

EID: 10744224919     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.507880     Document Type: Conference Paper

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