Design and fabrication of new optics for X-ray microscopy and material science

Journal De Physique. IV : JP

Volumn 104, Issue , 2003, Pages 177-183

  Di Fabrizio, E ^a   Cojoc, D ^a,b   Cabrini, S ^a   Kaulich, B ^a   Wilhein, T ^c   Susini, J ^d  

^a SINCROTRONE TRIESTE   (Italy)

^b UNIVERSITY POLITEHNICA OF BUCHAREST   (Romania)

^c Koblenz University of Applied Science   (Germany)

^d EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; FLUORESCENCE; FOCUSING; LIGHT SOURCES; OPTICAL DEVICES; OPTICAL MICROSCOPY; ULTRAVIOLET SPECTROSCOPY; X RAY OPTICS;

FULL FIELD IMAGING MICROSCOPY; ULTRAVIOLET MICROSCOPY; X RAY DIFFRACTIVE OPTICS; X RAY MICROSCOPY;

DIFFRACTIVE OPTICS;

EID: 0037687961     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:200300056     Document Type: Conference Paper

References (6)

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4. V. Soifer, V. Kotlyar, L. Doskolovich, Iterative methods for diffractive optical elements computation (Taylor-Francis Ltd, 1997).
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6. T. Wilhein, B. Kaulich, E. Di Fabrizio, F. Romanato, S. Cabrini, J. Susini, Appl. Phys. Lett. 78, (2001), 2082