Nanometric Cu-Co multilayers electrodeposited on indium-tin oxide glass

Journal of the Electrochemical Society

Volumn 146, Issue 5, 1999, Pages 1794-1797

  Chassaing, E ^a   Morrone, A ^b   Schmidt, J E ^b  

^a CNRS   (France)

^b FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT; COPPER; ELECTRODEPOSITION; ELECTROLYTES; MAGNETISM; MAGNETIZATION; MAGNETORESISTANCE; SEMICONDUCTING GLASS; SEMICONDUCTING INDIUM COMPOUNDS; SUBSTRATES;

INDIUM TIN OXIDE;

METALLIC SUPERLATTICES;

EID: 0032665801     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391845     Document Type: Article

References (24)

1. M. N. Baibich, J. M. Broto, A. Fert, F. Nguyen Van Dau, F. Petroff, P. Etienne, G. Creuset, A. Friederich, and J. Chazelas, Phys. Rev. Lett., 61, 2472 (1988).
2. S. S. P. Parkin, Z. G. Li, and D. J. Smith, Appl. Phys. Let., 58, 2710 (1991).
3. A. L. Greer and R. E. Somekh, Mater. Sci. Technol., 15, 346 (1991).
4. J. Yahalom and O. Zadok, J. Mater. Sci., 22, 499 (1987).
5. C. A. Ross, Annu. Rev. Mater. Sci., 24, 159 (1994).
6. M. Dariel, L. H. Bennett, D. S. Lashmore, P. Lubitz, M. Rubinstein, W. L. Lechter, and M. Z. Harford, J. Appl. Phys., 61, 4067 (1987).
7. V. M. Fedosyuk and O. I. Kasyutich, J. Magn. Magn. Mater., 125, 330 (1993).
8. S. Z. Hua, D. S. Lashmore, L. Salamancariba, W. Schwarzacher, L. J. Swartzenruber, R. D. McMichael, L. H. Bennett, and R. Hart, J. Appl Phys., 76, 6519 (1994).
9. E. Chassaing, P. Nallet, M. Walls, and M. Hytch, in Magnetic Materials, Processes, and Devices IV, L. T. Romankiw and J. D. A. Herman, Editors, PV 95-18, p. 125, The Electrochemical Society Proceedins Series, Pennington, NJ (1995).
10. K. D. Bird and M. Schlesinger, J. Electrochem. Soc., 142, L65 (1995).
11. S. K. J. Lenczowski, C. Schonenberger, M. A. M. Gijs, and W. J. M. Dejonge, J. Magn. Magn. Mater., 148, 455 (1995).
12. E. Chassaing, P. Nallet, and M. F. Trichet, J. Phys. IV, 6, C7 (1996).
13. E. Chassaing, P. Nallet, and M. F. Trichet, J. Electrochem. Soc., 143, L98 (1996).
14. Y. Jyoko, S. Kashiwabara, and Y. Hayashi, J. Electrochem. Soc., 144, L5 (1997).
15. P. Nallet, E. Chassaing, J. E. Schmidt, and A. Morrone, in Thin Film Materials, Processes, Reliability, and Applications, G. S. Mathad, M. Engelhardt, B. Agius, Editors, The Electrochemical Society Proceedings Series, Pennington, NJ, In press.
16. W. Schwarzacher and D. S. Lashmore, IEE Trans. Mag., 32, 3133 (1996).
17. E. Chassaing, J. Electrochem. Soc., 144, L3218 (1997).
18. E. P. EerNisse, J. Appl. Phys., 43, 1330 (1972).
19. E. Klokholm and B. S. Berry, J. Electrochem. Soc., 115, 823 (1968).
20. W. Haiss, R. J. Nichols, and J.-K. Sass, Surf. Sci., 388, 141 (1997).
21. V. M. Fedosyuk and O. I. Kasyutich, J. Magn. Magn. Mater., 125, 330 (1993).
22. S. Kashiwabara, Y. Jyoko, and Y. Hayashi, Physica B, 239, 47 (1997).
23. M. Alper, W. Schwarzacher, and S. J. Lane, J. Electrochem. Soc., 144, 2346 (1997).
24. F. Basile, J. Bergner, C. Bombart, P. Nallet, E. Chassaing, and G. Lorang, Microsc. Microanal. Microst., 8, 301 (1997).