In situ magnetization measurements of Cu/Co multilayers during the process of electrodeposition

Journal of Applied Physics

Volumn 90, Issue 10, 2001, Pages 5257-5260

  Gundel A ^a   Chassaing, E ^b   Schmidt, J E ^a  

^a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^b CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038689202     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1413233     Document Type: Article

References (11)

1. S. S. P. Parkin, Z. G. Li, and D. J. Smith, Appl. Phys. Lett. 58, 2710 (1991).
2. P. Nallet, E. Chassaing, J. E. Schmidt, and A. Morrone, in Interconnect and Contact Metallization/1997, edited by H. S. Rathore and G. S. Matthad, The Electrochemical Society Proceedings Series, (Electrochemical Society, Pennington, NJ, 1998), p. 84.
3. E. Chassaing, J. E. Schmidt, and A. Morrone, J. Electrochem. Soc. 146, 1794 (1999).
4. E. Chassaing, A. Morrone, and J. E. Schmidt, in Electrochemical Technology AP, edited by L. T. Romankiw, T. Osaka, Y. Yamazaki and C. Madore, The Electrochemical Society Proceedings Series, (Electrochemical Society, Pennington, NJ, 1999), p. 235.
5. W. Sehwarzacher and D. S. Lashmore, IEE Trans. Magn. 32, 3133 (1996).
6. LAM - Laboratório de Magnetismo - Instituto de Física, Universidade Federal do Rio Grande do Sul; J. E. Schmidt et al. (unpublished).
7. S. Roy, M. Matlosz, and D. Landolt, J. Electrochem. Soc. 141, 1509 (1994).
8. J. J. Kelly, P. Bradley, and D. Landolt, J. Electrochem. Soc. 147, 2975 (2000).
9. M. Walls and E. Chassaing (unpublished).
10. A. Gündel, E. Chassaing, J. E. Schmidt, in Fundamental Aspects of Electrochemical Deposition and Dissolution Including Modeling, edited by R. Aogaki, D. Landolt, M. Matlosz, Y. Sato, and J. B. Talbot, The Electrochemical Society Proceedings Series (Electrochemical Society, Pennington, NJ, 1999), p. 135.
11. R. Gans, Ann. Phys. (Paris) 15, 28 (1932).