Polarization dependence of light intensity distribution near a nanometric aluminum slit

Journal of the Optical Society of America B: Optical Physics

Volumn 21, Issue 5, 2004, Pages 1005-1012

  Wei, Cheng Hung ^a   Tsao, Pei Hsi ^a   Fann, Wunshain ^a   Wei, Pei Kuen ^b   Tegenfeldt, Jonas O ^c   Austin, Robert H ^d  

^a INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES   (Taiwan)

^b ACADEMIA SINICA   (Taiwan)

^c LUND UNIVERSITY   (Sweden)

^d PRINCETON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; COMPUTER SIMULATION; FINITE DIFFERENCE METHOD; MATHEMATICAL MODELS; METALLIC FILMS; MOLECULAR STRUCTURE; NANOSTRUCTURED MATERIALS; OPTIMIZATION; RADIOMETRY; SURFACE PROPERTIES; THICKNESS MEASUREMENT; TIME DOMAIN ANALYSIS;

LIGHT INTENSITY DISTRIBUTION; MOLECULAR SCANNING SCHEMES; NANOMETRIC ALUMINUM SLIT; NEAR FIELD RADIATION PATTERN; POLARIZATION DEPENDENCE;

LIGHT POLARIZATION;

EID: 10044294969     PISSN: 07403224     EISSN: None     Source Type: Journal    
DOI: 10.1364/JOSAB.21.001005     Document Type: Article

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