Chemisorption of NO2 at Boron sites at the surface of nanostructured mesoporous silicon

Journal of Physical Chemistry B

Volumn 108, Issue 47, 2004, Pages 18306-18310

  Geobaldo, Francesco ^a   Rivolo, Paola ^a   Borini, Stefano ^b   Boarino, Luca ^b   Amato, Giampiero ^b   Chiesa, Mario ^c   Garrone, Edoardo ^a  

^a POLITECNICO DI TORINO   (Italy)

^b Thin Film Lab   (Italy)

^c UNIVERSITY OF TURIN   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; BORON; CARRIER CONCENTRATION; CHEMISORPTION; ELECTROCHEMISTRY; ENTHALPY; ETCHING; MESOPOROUS MATERIALS; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PARAMAGNETIC RESONANCE; REACTION KINETICS; SILICON; SURFACE PHENOMENA;

DRUDE MODEL; ELECTROCHEMICAL ETCHING; LANGMUIR ISOTHERM; MESOPOROUS SILICON;

NITROGEN OXIDES;

EID: 10044283219     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp046918k     Document Type: Article

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