Photosensitive poly(amic acid)/organoclay nanocomposites

Polymer

Volumn 44, Issue 19, 2003, Pages 5533-5540

  Hsu, Steve Lien Chung ^a   Wang, Ulin ^a   King, Jinn Shing ^b   Jeng, Jyh Long ^b  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

Nanocomposite; Photosensitive; Polyimide

Indexed keywords

CLAY; COPOLYMERS; ION EXCHANGE; PHOTORESISTS; PHOTOSENSITIVITY; THERMAL EXPANSION; TRANSMISSION ELECTRON MICROSCOPY; VISCOSITY; X RAY DIFFRACTION ANALYSIS;

ORGANOCLAY;

NANOSTRUCTURED MATERIALS;

AMMONIA; ANILINE DERIVATIVE; BENZOPHENONE DERIVATIVE; COPOLYMER; DODECYLAMINE; MONTMORILLONITE; PHOSPHONIC ACID DERIVATIVE; POLYAMIC ACID; POLYMER; UNCLASSIFIED DRUG;

ARTICLE; CATION EXCHANGE; CHEMICAL ANALYSIS; DISPERSION; FILM; NANOPARTICLE; PARTICLE SIZE; POLYMERIZATION; REACTION ANALYSIS; TEMPERATURE DEPENDENCE; THERMODYNAMICS; TRANSMISSION ELECTRON MICROSCOPY; VISCOSITY; X RAY DIFFRACTION;

NANOCOMPOSITE;

EID: 0041379471     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0032-3861(03)00626-8     Document Type: Article

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