Determination of XUV optical constants by reflectometry using a high-repetition rate 46.9-nm laser

IEEE Journal on Selected Topics in Quantum Electronics

Volumn 5, Issue 6, 1999, Pages 1495-1501

  Artioukov, I A ^a   Benware, B R ^b   Rocca, J J ^b   Forsythe, M ^b   Uspenskii, Yu A ^a   Vinogradov, A V ^a  

^a LEBEDEV PHYSICAL INSTITUTE   (Russian Federation)

^b Department of Civil and Environmental Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IRIDIUM; LIGHT MEASUREMENT; REFLECTOMETERS; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTING SILICON; ULTRAVIOLET RADIATION; X RAY LASERS;

OPTICAL CONSTANTS; SOFT X RAY LASER; TABLE TOP LASER; X RAY ULTRAVIOLET REFLECTOMETRY;

LIGHT REFLECTION;

EID: 0033225050     PISSN: 1077260X     EISSN: None     Source Type: Journal    
DOI: 10.1109/2944.814989     Document Type: Article

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