Scattering loss in silicon-on-insulator rib waveguides fabricated by inductively coupled plasma reactive ion etching

Applied Physics Letters

Volumn 85, Issue 18, 2004, Pages 3995-3997

  Wang, Yongjin ^a   Lin, Zhilang ^a   Cheng, Xinli ^a   Zhang, Changsheng ^a   Gao, Fan ^a   Zhang, Feng ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; CRYSTALLINE MATERIALS; INDUCTIVELY COUPLED PLASMA; INTERFACES (MATERIALS); INTERFEROMETERS; LITHOGRAPHY; MICROSCOPIC EXAMINATION; OPTICAL WAVEGUIDES; REACTIVE ION ETCHING; SURFACE ROUGHNESS;

CHEMICAL MECHANICAL POLISHING (CMP); ENDFACE ROUGHNESS; HIGH-INDEX CONTRAST WAVEGUIDES; ROOT-MEAN-SQUARE (RMS) ROUGHNESS; SCATTERING LOSS;

SILICON ON INSULATOR TECHNOLOGY;

EID: 10044227400     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1815063     Document Type: Article

References (15)

1. S. Cristoloveanu, Solid-State Electron. 45, 1402 (2001).
2. R. A. Soref, Proc. IEEE 81, 1687 (1993).
3. P. Dainesi, A. Küng, M. Chabloz, A. Lagos, Ph. Flückiger, A. Ionescu, P. Fazan, M. Declerq, Ph. Renaud, and Ph. Robert, IEEE Photonics Technol. Lett. 12, 660 (2000).
4. M. de Labachelerie, N. Kaou, V. Armbruster, J.-C. Jeannot, P. Mollier, H. Porte, and N. Devoldère, Sens. Actuators, A 89, 36 (2001).
5. M. A. Rosa, N. Q. Ngo, D. Sweatman, S. Dimitrijev, and H. B. Harrison, IEEE J. Sel. Top. Quantum Electron. 5, 1249 (1999).
6. M. Guendouz, N. Pedrono, J. Charrier, P. Joubert, and J. Le Rouzic, Electron. Lett. 33, 1695 (1997).
7. J. H. Jang, W. Zhao, J. W. Bae, D. Selvanathan, S. L. Rommel, I. Adesida, A. Lepore, M. Kwakernaak, and J. H. Abeles, Appl. Phys. Lett. 83, 4116 (2003).
8. K. K. Lee, D. R. Lim, H. C. Luan, A. Agarwal, J. Foresi, and L. C. Kimerling, Appl. Phys. Lett. 77, 1617 (2000).
9. R. A. Soref, J. Schmidtchen, and K. Petermann, IEEE J. Quantum Electron. 27, 1971 (1991).
10. J. M. Bennett and L. Mattsson, Introduction to Surface Roughness and Scattering (Optical Society of America, Washington, DC, 1989).
11. A. G. Rickman, G. T. Reed, and F. Namavar, J. Lightwave Technol. 12, 1771 (1994).
12. U. Fischer, T. Zinke, J.-R. Kropp, F. Arndt, and K. Petermann, IEEE Photonics Technol. Lett. 8, 647 (1996).
13. Y. Wang et al., J. Non-Cryst. Solids 333, 296 (2004).
14. P. K. Tien, Appl. Opt. 10, 2395 (1971).
15. D. Marcuse, Light Transmission Optics, 2nd ed. (Van Nostrand Reinhold, New York, 1982).