Electrochemical micromachining of silicon platforms for optical fibre alignment

Electronics Letters

Volumn 33, Issue 20, 1997, Pages 1695-1696

  Guendouz, M ^a   Pedrono, N ^b   Charrier, J ^a   Joubert, P ^a   Le Rouzic, J ^b  

^a UNIVERSITÉ DE RENNES 1   (France)

^b ORANGE LABS   (France)

Author keywords

Micromachining

Indexed keywords

ETCHING; MASKS; MICROMACHINING; PHOTORESISTS; POROUS SILICON; SILICON WAFERS; SUBSTRATES;

ELECTROCHEMICAL MICROMACHINING; OPTICAL FIBER ALIGNMENT;

OPTICAL FIBERS;

EID: 0031224249     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19971166     Document Type: Article

References (5)

1. BEAN, K.E.: 'Anisotropic etching of silicon', IEEE Trans., 1978, ED-25, pp. 1185-1193
2. SEIDEL, H., CSEPREGI, L., HEUBERGER, A., and BAUMGARTEL, H.: 'Anisotropic etching of crystalline silicon in alkaline solutions, I, Orientation dependence and behaviour of passivation layers', J. Electrochem. Soc., 1990, 137, (11), pp. 3612-3626
3. DEIMEL P.P.: 'Micromachining processes and structures in microoptics and optoelectronics', J. Micromech. Microeng., 1990, 1, pp. 199-222
4. SMITH, R.L., and COLLINS, S.D.: 'Porous silicon formation mechanisms', J. Appl. Phys., 1992, 71, pp. R1-R22
5. BELL, T.E., GENISSEN, P.T., DE MUNTER, D., and KUHL, M.: 'Porous silicon as a sacrificial material', J. Micromech. Microeng., 1996, 6, pp. 361-369