Observation of the barrier structure in magnetic tunnel junctions using high-resolution electron microscopy and electron holography

Applied Physics Letters

Volumn 83, Issue 26, 2003, Pages 5482-5484

  Shen, F ^a   Zhu, T ^a   Xiang, X H ^b   Xiao, John Q ^b   Voelkl, E ^c   Zhang, Z ^a  

^a INSTITUTE OF PHYSICS   (China)

^b UNIVERSITY OF DELAWARE   (United States)

^c nLine Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETIC TUNNEL JUNCTIONS (MTJ); TUNNEL MAGNETORESISTANCE (TMR);

COMPUTER SOFTWARE; ELECTRIC CHARGE; ELECTRON HOLOGRAPHY; HIGH RESOLUTION ELECTRON MICROSCOPY; INTERFACES (MATERIALS); MAGNETORESISTANCE; MICROSTRUCTURE; MORPHOLOGY; NICKEL COMPOUNDS; OXIDATION;

TUNNEL JUNCTIONS;

EID: 0942288637     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1637129     Document Type: Article

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