Study of the effect of natural oxidation and thermal annealing on microstructures of AlOx in the magnetic tunnel junction by high-resolution transmission electron microscopy

Applied Physics Letters

Volumn 80, Issue 7, 2002, Pages 1168-1170

  Bae, Jun Soo ^a   Shin, Kyung Ho ^b   Lee, Taek Dong ^a   Lee, Hyuck Mo ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CONTINUOUS FILMS; GRAIN BOUNDARY OXIDATION; MAGNETIC TUNNEL JUNCTION; METALLIC LAYERS; MICROSTRUCTURAL CHANGES; NATURAL OXIDATION; OXIDE LAYER; REPRODUCIBILITIES; THERMAL-ANNEALING; VOLUME EXPANSION;

COBALT; GRAIN BOUNDARIES; MAGNETIC DEVICES; OXIDATION; TRANSMISSION ELECTRON MICROSCOPY; TUNNEL JUNCTIONS;

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;

EID: 79956035450     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1451988     Document Type: Article

References (14)

1. J. S. Moodera, L. R. Kinder, T. M. Wong, and R. Meservey, Phys. Rev. Lett. 74, 3273 (1995). prl PRLTAO 0031-9007
2. T. Miyazaki and N. Tezuka, J. Magn. Magn. Mater. 139, L231 (1995). jmm JMMMDC 0304-8853
3. T. Miyazaki, N. Tezuka, S. Kumagai, Y. Ando, H. Kubota, J. Murai, T. Watabe, and M. Yokota, J. Phys. D 31, 630 (1998). jpd JPAPBE 0022-3727
4. S. S. P. Parkin, K. P. Roche, M. G. Samant, P. M. Rice, R. B. Beyers, R. E. Scheuerlein, E. J. O'Sullivan, S. L. Brown, J. Bucchigano, D. W. Abraham, Y. Lu, M. Rooks, P. L. Trouilloud, R. A. Wanner, and W. J. Gallagher, J. Appl. Phys. 85, 5828 (1999). jap JAPIAU 0021-8979
5. X. F. Han, M. Oogane, H. Kubota, Y. Ando, and T. Miyazaki, Appl. Phys. Lett. 77, 283 (2000). apl APPLAB 0003-6951
6. Y. Ando, M. Yokota, N. Tezuka, and T. Miyazaki, J. Magn. Magn. Mater. 198, 155 (1999). jmm JMMMDC 0304-8853
7. Y. Ando, H. Kubota, M. Hayashi, M. Kamijo, K. Yaoita, A. C. C. Yu, X. F. Han, and T. Miyazaki, Jpn. J. Appl. Phys., Part 1 39, 5832 (2000). jjb JAPNDE 0021-4922
8. S. Kumagai, N. Tezuka, and T. Miyazaki, Jpn. J. Appl. Phys., Part 2 36, L1498 (1997). jjc JAPLD8 0021-4922
9. P. K. Wong, J. E. Evetts, and M. G. Blamire, J. Appl. Phys. 83, 6697 (1998). jap JAPIAU 0021-8979
10. J. S. Bae, K. H. Shin, and H. M. Lee, J. Appl. Phys. (accepted for publication).
11. R. C. Sousa, J. J. Sun, V. Soares, P. P. Freitas, A. Kling, M. F. da Silva, and J. C. Soares, Appl. Phys. Lett. 73, 3288 (1998). apl APPLAB 0003-6951
12. M. Sato and K. Kobayashi, IEEE Trans. Magn. 33, 3553 (1997). emg IEMGAQ 0018-9464
13. M. Sato, H. Kikuchi, and K. Kobayashi, J. Appl. Phys. 83, 6691 (1998). jap JAPIAU 0021-8979
14. D. J. Smith, M. R. McCartney, C. L. Platt, and A. E. Berkowitz, J. Appl. Phys. 83, 5154 (1998). jap JAPIAU 0021-8979