Correction for local flare effects approximated with double Gaussian profile in ArF lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2806-2809

  Osawa, Morimi ^a   Yao, Teruyoshi ^a   Aoyama, Hajime ^a   Ogino, Koro ^a   Hoshino, Hiromi ^a   Machida, Yasuhide ^a   Asai, Satoru ^a   Arimoto, Hiroshi ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMPLIFIERS (ELECTRONIC); DATA REDUCTION; LIGHT SCATTERING; LITHOGRAPHY; MASKS; PATTERN RECOGNITION;

DENSITY MAP METHOD; LOCAL FLARE CORRECTION (LFC);

EXCIMER LASERS;

EID: 0942267537     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1629286     Document Type: Conference Paper

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