Measuring flare and its effect on process latitude

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 708-713

  Park, Jung Chul ^a   Kang, Hoyoung ^a   Moon, Joo T ^a   Lee, Moon Yong ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; LIGHT SCATTERING; MASKS; PHOTORESISTS; ULTRAVIOLET RADIATION;

OPTICAL MICROLITHOGRAPHY; STEPPER LENS FLARE;

PHOTOLITHOGRAPHY;

EID: 0031364439     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.276043     Document Type: Conference Paper

References (1)