High thermal stability of magnetic tunnel junctions with oxide diffusion barrier layers

Applied Physics Letters

Volumn 84, Issue 2, 2004, Pages 233-235

  Fukumoto, Yoshiyuki ^a   Shimura, Ken Ichi ^a   Kamijo, Atsushi ^a   Tahara, Shuichi ^a   Yoda, Hiroaki ^b  

^a NEC CORPORATION   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ANTIFERROMAGNETIC MATERIALS; ENERGY DISPERSIVE SPECTROSCOPY; LEAKAGE CURRENTS; MAGNETIC DEVICES; MAGNETORESISTANCE; PHOTOLITHOGRAPHY; RANDOM ACCESS STORAGE; SECONDARY ION MASS SPECTROMETRY; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

DC FOUR PROBE METHOD; ION MILLING; MAGNETIC RANDOM ACCESS MEMORIES; MAGNETIC TUNNEL JUNCTIONS; TUNNEL BARRIER; TUNNEL MAGNETORESISTANCE;

TUNNEL JUNCTIONS;

EID: 0842333244     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1639128     Document Type: Article

References (14)

1. T. Miyazaki and N. Tezuka, J. Magn. Magn. Mater. 139, L231 (1995).
2. J. S. Moodera, L. R. Kinder, T. M. Wong, and R. Meservey, Phys. Rev. Lett. 74, 3273 (1995).
3. W. J. Gallagher, S. S. P. Parkin, Y. Lu, X. P. Bian, A. Marley, K. P. Roche, R. A. Altman, S. A. Rishton, C. Jahnes, T. M. Shaw, and G. Xiao, J. Appl. Phys. 81, 3741 (1997).
4. J. Daughton, J. Appl. Phys. 81, 3758 (1997).
5. S. Cardoso, R. Ferreira, P. P. Freitas, P. Wei, and C. Soares, Appl. Phys. Lett. 76, 3792 (2000).
6. J. Schmalhorst, H. Brückl, G. Reiss, G. Gieres, and J. Wecker, J. Appl. Phys. 91, 6617 (2002).
7. S. S. P. Parkin, K.-S. Moon, K. E. Pettit, D. J. Smith, R. E. Dunin-Borkowski, and M. R. McCartney, Appl. Phys. Lett. 75, 543 (1999).
8. Z. Zhang, S. Cardoso, P. P. Freitas, X. Batlle, P. Wei, N. Barradas, and J. C. Soares, J. Appl. Phys. 89, 6665 (2001).
9. N. Matsukawa, A. Odagawa, Y. Sugita, Y. Kawashima, Y. Morinaga, S. Satomi, M. Hiramoto, and J. Kuwata, Appl. Phys. Lett. 81, 4784 (2002).
10. N. Sakimura, T. Sugibayashi, T. Honda, S. Miura, H. Numata, H. Hada, and S. Tahara, ISSCC Digest of Technical Papers, 2003, pp. 278-279.
11. Y. Fukumoto and A. Kamijo, Jpn. J. Appl. Phys. 41, L183 (2002).
12. L. Neel, Acad. Sci., Paris, C. R. 255, 1676 (1962).
13. A. Maesaka, N. Sugawara, A. Okabe, and M. Itabashi, J. Appl. Phys. 83, 7628 (1998).
14. J. Zhang and R. M. White, J. Appl. Phys. 83, 6512 (1998).