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Volumn , Issue , 2000, Pages 164-168

CMOSFET characteristics induced by moisture diffusion from inter-layer dielectric in 0.23 um DRAM technology with shallow trench isolation

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC FILMS; DIFFUSION IN SOLIDS; DYNAMIC RANDOM ACCESS STORAGE; HOT CARRIERS; MOISTURE; SEMICONDUCTING BORON; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR JUNCTIONS; SILICA; SILICON NITRIDE;

EID: 0033750708     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article
Times cited : (12)

References (6)
  • Reference 정보가 존재하지 않습니다.

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.