Experimental and computer simulation studies of the "baffled target" reactive sputtering process

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 6, 2003, Pages 1981-1987

  Engelmark, F ^a   Westlinder, J ^a   Nyberg, T ^a   Berg, S ^a  

^a UPPSALA UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CALCULATIONS; CHEMICAL COMPOUNDS; COMPOSITION; COMPUTER SIMULATION; DEPOSITION; FILMS; FLOW OF FLUIDS; GASES; MAGNETIC HYSTERESIS; OXYGEN; PARTIAL PRESSURE;

BAFFLED TARGET; DEPOSITION RATE; REACTIVE GAS FLOW; STOICHIOMETRIC COMPOUND FILM; TARGET POISONING;

MAGNETRON SPUTTERING;

EID: 0842290155     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1619418     Document Type: Article

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