Airborne chemical contamination of a chemically amplified resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 1466, Issue , 1991, Pages 2-12

  MacDonald, S A ^a   Clecak, N J ^a   Wendt, H R ^a   Willson, C G ^a   Snyder, C D ^a   Knors, C J ^a   Deyoe, N B ^a   Maltabes, J G ^a   Morrow, J R ^a   McGuire, A E ^a   Holmes, S J ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTORESISTS;

CHEMICALLY AMPLIFIED RESISTS; WAFERS;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0025791333     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)