Conelike Defect in Deep Quartz Etching Employing Neutral Loop Discharge

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 10, 2003, Pages 6691-6697

  Fukasawa, Takayuki ^a   Hayashi, Toshio ^b   Horiike, Yasuhiro ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b ULVAC INC   (Japan)

Author keywords

C3F8; Cone; Deep etching; Defect; MEMS; Microcapillary; NLD; Quartz; RIE lag; Roughness

Indexed keywords

CAPILLARITY; DEFECTS; FLUOROCARBONS; MASKS; MICROELECTROMECHANICAL DEVICES; PLASMA ETCHING; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTIES; SURFACE ROUGHNESS;

MICROCAPILLARY; MICROMASKS;

QUARTZ;

EID: 0348219410     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.6691     Document Type: Article

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