Development and plasma characteristics measurement of planar-type magnetic neutral loop discharge etcher

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 8, 1998, Pages 4572-4577

  Chinzei, Yasuhiko ^d   Ogata, Makoto ^d   Sunada, Tsuyoshi ^a   Itoh, Masahiro ^a   Hayashi, Toshio ^a   Shindo, Haruo ^b   Itatani, Ryohei ^c   Ichiki, Takanori ^d   Horiike, Yasuhiro ^d  

^a ULVAC INC   (Japan)

^b TOKAI UNIVERSITY   (Japan)

^c NIIHAMA NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^d TOYO UNIVERSITY   (Japan)

Author keywords

Electron energy; High density plasma; Planar type magnetic neutral loop discharge; Silicon oxide etching; Uniformity

Indexed keywords

ELECTRIC DISCHARGES; ELECTRONIC DENSITY OF STATES; EMISSION SPECTROSCOPY; PLASMA ETCHING;

PLANAR-TYPE MAGNETIC NEUTRAL LOOP DISCHARGE;

PLASMA DIAGNOSTICS;

EID: 0032131321     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.4572     Document Type: Article

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