Deep dry etching of quartz plate over 100 μm in depth employing ultra-thick photoresist (SU-8)

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 A, 2003, Pages 3702-3706

  Fukasawa, Takayuki ^a   Horiike, Yasuhiro ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Deep etching; Defect; Etch rate variation; Instability; Quartz; SU 8

Indexed keywords

CLEANING; ETCHING; INDUCTIVELY COUPLED PLASMA; PHOTORESISTS; PLATE METAL; SCANNING ELECTRON MICROSCOPY;

DEEP DRY ETCHING; QUARTZ PLATE; ULTRA THICK PHOTORESIST;

QUARTZ;

EID: 0042381533     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3702     Document Type: Article

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