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Volumn 221, Issue 1-4, 2004, Pages 160-166
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Removal of Si(1 1 1) wafer surface etch pits generated in ammonia-peroxide clean step
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Author keywords
Etch pits; SC 1 treatment; Si(1 1 1) wafer; Surface flattening; Surface roughening
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Indexed keywords
AMMONIA;
ATOMIC FORCE MICROSCOPY;
ETCHING;
NATURAL FREQUENCIES;
OXIDATION;
SINGLE CRYSTALS;
SURFACE ROUGHNESS;
ULSI CIRCUITS;
ULTRASONICS;
ETCH PITS;
ROOT MEAN SQUARE (RMS) ROUGHNESS;
SILICON WAFERS;
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EID: 0348209116
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(03)00876-6 Document Type: Article |
Times cited : (8)
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References (16)
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