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Volumn 221, Issue 1-4, 2004, Pages 160-166

Removal of Si(1 1 1) wafer surface etch pits generated in ammonia-peroxide clean step

Author keywords

Etch pits; SC 1 treatment; Si(1 1 1) wafer; Surface flattening; Surface roughening

Indexed keywords

AMMONIA; ATOMIC FORCE MICROSCOPY; ETCHING; NATURAL FREQUENCIES; OXIDATION; SINGLE CRYSTALS; SURFACE ROUGHNESS; ULSI CIRCUITS; ULTRASONICS;

EID: 0348209116     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00876-6     Document Type: Article
Times cited : (8)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.