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Volumn 200, Issue 1, 2003, Pages 87-90

High efficiency GaN-based LEDs using plasma selective treatment of p-GaN surface

Author keywords

[No Author keywords available]

Indexed keywords

GALLIUM NITRIDE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; REACTIVE ION ETCHING; SILICON NITRIDE;

EID: 0348146365     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.200303253     Document Type: Article
Times cited : (12)

References (9)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.