Emission spectroscopy of laser-ablated Si plasma related to nanoparticle formation

Applied Surface Science

Volumn 222, Issue 1-4, 2004, Pages 382-393

  Narayanan, V ^a   Thareja, R K ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARRIER CONCENTRATION; CHARGE COUPLED DEVICES; ELECTRON TRANSITIONS; EMISSION SPECTROSCOPY; KINETIC ENERGY; LASER PULSES; NANOSTRUCTURED MATERIALS; PARTICLE SIZE ANALYSIS; PHOTOLUMINESCENCE; PLASMA COLLISION PROCESSES; PULSED LASER DEPOSITION; QUANTUM THEORY; THIN FILMS; VAPOR PRESSURE;

STARK-BROADENING; TEMPORAL VARIATION;

SILICON WAFERS;

EID: 0348014443     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.09.038     Document Type: Article

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