Resistance Change in Thin Ag Film on Si (100)

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 10, 2003, Pages 6532-6534

  Yukawa, Motonobu ^a   Noritake, Hideaki ^a   Tanaka, Ryoichi ^a   Iida, Shoji ^a  

^a OSAKA SANGYO UNIVERSITY   (Japan)

Author keywords

Ag film; Ag Si; Conduction mechanism; Resistance of thin film; Thin film

Indexed keywords

ACETONE; DEPOSITION; ELECTRIC CHARGE; ELECTRIC CONDUCTANCE; ELECTRIC RESISTANCE; ELECTRODES; FERMI LEVEL; INTERFACES (MATERIALS); LOW TEMPERATURE EFFECTS; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SILICON; SILVER;

ELECTRON CONDUCTION; FILM RESISTANCE; FILM THICKNESS;

THIN FILMS;

EID: 0347590769     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.6532     Document Type: Article

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