메뉴 건너뛰기




Volumn 15, Issue 47, 2003, Pages 8123-8135

Characterization of thin films of a-SiOx (1.1 < x < 2.0) prepared by reactive evaporation of SiO

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; EVAPORATION; FUSED SILICA; OXYGEN; REFRACTIVE INDEX; SPECTROPHOTOMETRY; STOICHIOMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0347588176     PISSN: 09538984     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-8984/15/47/015     Document Type: Article
Times cited : (34)

References (23)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.