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Volumn 15, Issue 47, 2003, Pages 8123-8135
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Characterization of thin films of a-SiOx (1.1 < x < 2.0) prepared by reactive evaporation of SiO
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL BONDS;
EVAPORATION;
FUSED SILICA;
OXYGEN;
REFRACTIVE INDEX;
SPECTROPHOTOMETRY;
STOICHIOMETRY;
X RAY PHOTOELECTRON SPECTROSCOPY;
OXYGEN CONCENTRATION;
OXYGEN PRESSURE;
RANDOM-BONDING MODEL;
REACTIVE EVAPORATION;
THIN FILMS;
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EID: 0347588176
PISSN: 09538984
EISSN: None
Source Type: Journal
DOI: 10.1088/0953-8984/15/47/015 Document Type: Article |
Times cited : (34)
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References (23)
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