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Volumn 325, Issue 1-2, 1998, Pages 36-41

Annealing effects on silicon-rich oxide films studied by spectroscopic ellipsometry

Author keywords

Annealing; Plasma enhanced chemical vapor deposition; Silicon rich oxide films

Indexed keywords

ANNEALING; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; HIGH TEMPERATURE EFFECTS; PLASMA APPLICATIONS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; STOICHIOMETRY;

EID: 0032117942     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00423-4     Document Type: Article
Times cited : (13)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.