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Volumn 325, Issue 1-2, 1998, Pages 36-41
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Annealing effects on silicon-rich oxide films studied by spectroscopic ellipsometry
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Author keywords
Annealing; Plasma enhanced chemical vapor deposition; Silicon rich oxide films
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Indexed keywords
ANNEALING;
CHEMICAL BONDS;
CHEMICAL VAPOR DEPOSITION;
ELLIPSOMETRY;
HIGH TEMPERATURE EFFECTS;
PLASMA APPLICATIONS;
SEMICONDUCTING SILICON COMPOUNDS;
SILICA;
STOICHIOMETRY;
SILICON RICH OXIDE FILMS;
SEMICONDUCTING FILMS;
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EID: 0032117942
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(98)00423-4 Document Type: Article |
Times cited : (13)
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References (15)
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