Electrical reliability of tunneling magnetoresistive read heads

Journal of Applied Physics

Volumn 94, Issue 12, 2003, Pages 7636-7645

  Bae, Seongtae ^a,c   Judy, Jack H ^a   Tsu, I Fei ^b   Davis, Marshall ^b  

^a UNIVERSITY OF MINNESOTA   (United States)

^b SEAGATE TECHNOLOGY   (United States)

^c Waverider Incorporated   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC TUNNEL BARRIERS; ELECTRICAL FAILURES; ELECTRICAL RELIABILITY;

CURRENT DENSITY; DIELECTRIC MATERIALS; ELECTRIC BREAKDOWN; ELECTRIC CURRENTS; ELECTRIC FIELD EFFECTS; ELECTRIC POTENTIAL; ELECTROMIGRATION; GIANT MAGNETORESISTANCE; INTERDIFFUSION (SOLIDS); MAGNETRON SPUTTERING; RELIABILITY; SIGNAL TO NOISE RATIO; TUNNEL JUNCTIONS;

MAGNETIC HEADS;

EID: 0347566273     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1627948     Document Type: Article

References (17)

1. J. R. Childress, M. M. Sehwickert, R. E. Fontana, M. K. Ho, P. M. Rice, and B. A. Gurney, J. Appl. Phys. 89, 7353 (2001).
2. M. L. Mallary, Proceedings of the Intermag Conference, San Francisco, (1999), BP-11.
3. J. Wang, P. P. Freitas, and E. Snoeck, Appl. Phys. Lett. 79, 4553 (2001).
4. M. Tsunoda, K. Nishikawa, S. Ogata, and M. Takahashi, Appl. Phy. Lett. 80, 753 (2002).
5. W. J. Gallagher, J. Appl. Phys. 81, 3741 (1997).
6. S. Araki, K. Sato, T. Kakami, S. Saruki, T. Uesugi, N. Kasahara, T. Kuwashima, N. Ohta, J. Sun, K. Nagai, S. Li, N. Machisuka, H. Harate, T. Kagotani, N. Takahashi, K. Ueda, and M. Matsuzaki, IEEE Trans. Magn. 38, 72 (2002).
7. W. Oepts, H. J. Verhagen, R. Coehoorn, and W. J. M. de Jonge, J. Appl. Phys. 86, 3863 (1999); W. Oepts, H. J. Verhagen, W. J. M. de Jonge, and R. Coehoorn, Appl. Phys. Lett. 73, 2363 (1998); W. Oepts, H. J. Verhagen, D. B. de Mooij, V. Zieren, R. Coehoorn, and W. J. M. de Jonge, J. Magn. Magn. Mater. 198, 164 (1999).
8. W. Oepts, H. J. Verhagen, R. Coehoorn, and W. J. M. de Jonge, J. Appl. Phys. 86, 3863 (1999); W. Oepts, H. J. Verhagen, W. J. M. de Jonge, and R. Coehoorn, Appl. Phys. Lett. 73, 2363 (1998); W. Oepts, H. J. Verhagen, D. B. de Mooij, V. Zieren, R. Coehoorn, and W. J. M. de Jonge, J. Magn. Magn. Mater. 198, 164 (1999).
9. W. Oepts, H. J. Verhagen, R. Coehoorn, and W. J. M. de Jonge, J. Appl. Phys. 86, 3863 (1999); W. Oepts, H. J. Verhagen, W. J. M. de Jonge, and R. Coehoorn, Appl. Phys. Lett. 73, 2363 (1998); W. Oepts, H. J. Verhagen, D. B. de Mooij, V. Zieren, R. Coehoorn, and W. J. M. de Jonge, J. Magn. Magn. Mater. 198, 164 (1999).
10. J. M. Clark, Insulating Materials for Design and Engineering Practice (Wiley, New York, 1692), Chap. 16; P. J. Horrap, Dielectrics (Wiley, New York, 1972), Chaps. 1-6.
11. J. M. Clark, Insulating Materials for Design and Engineering Practice (Wiley, New York, 1692), Chap. 16; P. J. Horrap, Dielectrics (Wiley, New York, 1972), Chaps. 1-6.
12. S. Bae, I. Tsu, E. S. Murdock, and J. H. Judy, J. Appl. Phys. 90, 2427 (2001); S. Bae, I. Tsu, M. Davis, E. S. Murdock, and J. H. Judy, IEEE Trans. Magn. 38, 2655 (2002).
13. S. Bae, I. Tsu, E. S. Murdock, and J. H. Judy, J. Appl. Phys. 90, 2427 (2001); S. Bae, I. Tsu, M. Davis, E. S. Murdock, and J. H. Judy, IEEE Trans. Magn. 38, 2655 (2002).
14. A. Gangulee and F. M. d'Heurle, Jpn. J. Appl. Phys., Suppl. 2, 625 (1974).
15. H. Tanabe and M. Kitada, Defect Diffus. Forum 95, 271 (1993).
16. I. Tsu, C. Chang, and H. S. Edelman, Mater. Res. Soc. Symp. Proc. 563, 139 (1999).
17. S. Shinubara, Y. Takeda, H. Sakue, T. Takahagi, and A. Verbruggen, Mater. Res. Soc. Symp. Proc. 563, 145 (1999).