Influences of ZnO buffer layers on the quality of ZnO films synthesized by the metal-organic chemical vapor deposition process

Journal of Electronic Materials

Volumn 32, Issue 11, 2003, Pages 1148-1154

  Park, Sun Hong ^a   Choi, Chul Hwan ^a   Kim, Kyoung Bo ^b   Kim, Seon Hyo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b AmorePacific Corporation   (South Korea)

Author keywords

Buffer layer; Metal organic chemical vapor deposition (MOCVD); Sputtering

Indexed keywords

ALUMINA; DIFFRACTION; LIGHT EMISSION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; SPUTTERING; SUBSTRATES; X RAY DIFFRACTION; ZINC OXIDE;

BAND-EDGE EMISSION; BUFFER LAYER; DIETHYLZINC; PHOTOLUMINESCENCE SPECTROSCOPY; ZINC OXIDE FILM;

THIN FILMS;

EID: 0346846610     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-003-0004-7     Document Type: Article

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