Preparation of vanadium dioxide thin film with high temperature coefficient of resistance from V2O5 powder by ion beam enhanced deposition

Wuli Xuebao/Acta Physica Sinica

Volumn 51, Issue 8, 2002, Pages 1792-

  Li, Jin Hua ^a,b,c   Yuan, Ning Yi ^a,b,c   Chan, H L W ^b   Lin, Cheng Lu ^c  

^a CHANGZHOU UNIVERSITY   (China)

^b HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^c SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

Ion beam enhanced deposition; Thermal coefficient of resistance; Vanadium dioxide thin film

Indexed keywords

EID: 0346425037     PISSN: 10003290     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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