VO2 thin films: Growth and the effect of applied strain on their resistance

Journal of Materials Science: Materials in Electronics

Volumn 9, Issue 3, 1998, Pages 187-191

  Bowman, R M ^a   Gregg, J M ^a  

^a QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC MATERIALS; CRYSTALLOGRAPHY; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; FILM GROWTH; PHASE TRANSITIONS; PULSED LASER DEPOSITION; STRAIN MEASUREMENT; SYNTHESIS (CHEMICAL); THIN FILMS; TRANSPORT PROPERTIES; X RAY DIFFRACTION ANALYSIS; DEPOSITION; OXIDATION; PULSED LASER APPLICATIONS; STRAIN; THERMAL EFFECTS; VANADIUM COMPOUNDS;

APPLIED STRAIN; VANADIUM OXIDE THIN FILMS; PULSED LASER DEPOSITION (PLD);

VANADIUM COMPOUNDS; SEMICONDUCTING FILMS;

EID: 0032099334     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1008822023407     Document Type: Article

References (11)

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