Characterization of amorphous carbon rich Si 1-x C x thin films obtained using high energy hydrocarbon ion beams on Si

Applied Surface Science

Volumn 141, Issue 1-2, 1999, Pages 141-147

  Huck, H ^a   Halac, E B ^a   Oviedo, C ^b   Zampieri, G ^c   Pregliasco, R G ^c   Alonso, E V ^d   Reinoso, M E ^a   De Benyacar, M A R ^a  

^a Depto de Fisica   (Argentina)

^b Departamento Materiales   (Argentina)

^c INSTITUTO BALSEIRO   (Argentina)

^d INVAP Argentina   (Argentina)

Author keywords

Amorphous silicon carbon films; AQ; ED; IL; Ion beam deposition; PG; RC; SG

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; CHEMICAL BONDS; ELECTRON ENERGY LOSS SPECTROSCOPY; FILM GROWTH; GRAPHITIZATION; ION BEAMS; RAMAN SPECTROSCOPY; SILICON CARBIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

HIGH ENERGY HYDROCARBON ION BEAMS;

AMORPHOUS FILMS;

EID: 0033098437     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00602-3     Document Type: Article

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