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Volumn 233, Issue 1-2, 2001, Pages 243-247

Effects of post-annealing on the microstructure and ferroelectric properties of YMnO3 thin films on Si

Author keywords

A1. transmission electron microscopy; B1. yittrium compounds; B2. ferroelectric materials

Indexed keywords

CRACK INITIATION; CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; CRYSTALLIZATION; CURRENT VOLTAGE CHARACTERISTICS; HIGH RESOLUTION ELECTRON MICROSCOPY; HYSTERESIS; RAPID THERMAL ANNEALING; RATE CONSTANTS; SEMICONDUCTING SILICON; SPUTTER DEPOSITION; SUBSTRATES; THERMAL EXPANSION; YTTRIUM COMPOUNDS;

EID: 0035501981     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)01563-9     Document Type: Article
Times cited : (10)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.