Characteristics of sputter-deposited Ru thin films on Si substrates

Materials Chemistry and Physics

Volumn 82, Issue 3, 2003, Pages 984-990

  Lee, Hsin Yi ^a   Hsieh, Yung Wei ^a   Hsu, C H ^a   Liang, K S ^a  

^a NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

Author keywords

rf sputtering; Ru; Thin film; X ray diffraction; X ray reflectivity

Indexed keywords

CONFORMATIONS; CRYSTAL ORIENTATION; ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; METALLIC FILMS; METALLOGRAPHIC MICROSTRUCTURE; MORPHOLOGY; RADIOFREQUENCY SPECTROSCOPY; RUTHENIUM COMPOUNDS; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

RADIOFREQUENCY SPUTTERING;

MATERIALS SCIENCE;

EID: 0345377442     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2003.08.022     Document Type: Article

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