Alternating-PSM repair by nanomachining

Microlithography World

Volumn 12, Issue 4, 2003, Pages 18-20

  Morikawa, Yasutaka ^a,c   Kokubo, Haruo ^a   Hayashi, Naoya ^a,d   White, Roy ^b  

^a DAI NIPPON PRINTING CO LTD   (Japan)

^b RAVE LLC   (United States)

^c Electronic Components Laboratory   (Japan)

^d High Speed Circuits Department

Author keywords

[No Author keywords available]

Indexed keywords

QUARTZ BUMP DEFECTS;

ATOMIC FORCE MICROSCOPY; CUTTING; DEFECTS; LITHOGRAPHY; MASKS; QUARTZ APPLICATIONS; SCANNING ELECTRON MICROSCOPY;

NANOTECHNOLOGY;

EID: 0345376979     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (5)

1. B. LoBianco, et al., "Use of Nanomachining for 100nm Nanometer Mask Repair," Proc. of BACUS, 4889, pp. 909-921, 2002.
2. D. Brinkley, et al., "Use of Nanomachining for Subtractive Repair of EUV and Other Challenging Mask Defects," Proc. of PMJ, 4754, pp. 900-911, 2002.
3. M. Verbeek, et al., "High Precision Mask Repair Using Nanomachining," EMC 2002.
4. R. White, et al., "Use of Nanomachining as a Technique to Reduce Scrap of High End Photomasks," Proc. of BACUS, 4562, pp. 213-224, 2001.
5. M. Laurance, "Subtractive Defect Repair Via Nanomachining," Proc. of BACUS, 4186, pp. 670-673, 2000.