A low-temperature, soft chemistry method for the synthesis of zirconia nanoparticles in thermally evaporated fatty amine thin films

Journal of Colloid and Interface Science

Volumn 269, Issue 1, 2004, Pages 126-130

  Shankar, S Shiv ^a   Joshi, Hrushikesh ^a   Pasricha, Renu ^a   Pavaskar, N R ^a   Mandale, A B ^a   Sastry, Murali ^a  

^a NATIONAL CHEMICAL LABORATORY   (India)

Author keywords

Electrostatic entrapment; Lipid films; Nanoparticles; Soft chemistry; Zirconia

Indexed keywords

AMINES; DISPERSIONS; EPITAXIAL GROWTH; EVAPORATION; GRAVIMETRIC ANALYSIS; HYDROLYSIS; LIPIDS; LOW TEMPERATURE EFFECTS; NANOSTRUCTURED MATERIALS; SYNTHESIS (CHEMICAL); THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY; ELECTROSTATICS; METAL IONS; NANOPARTICLES; PHOTOELECTRONS; QUARTZ CRYSTAL MICROBALANCES; TEMPERATURE; X RAY DIFFRACTION;

MONOCLINIC PHASES; LIPID FILMS; METAL-ION COMPLEXES; PREFERRED ORIENTATIONS; QUARTZ CRYSTAL MICROGRAVIMETRY; SOFT CHEMISTRY; SOFT CHEMISTRY METHOD; ZIRCONIA NANOPARTICLES; ZIRCONIA PARTICLES;

ZIRCONIA;

AMINE; ION; LIPID; METAL COMPLEX; METAL ION; NANOPARTICLE; OCTADECYLAMINE; SILICON DIOXIDE; ZIRCONIUM OXIDE;

ABSORPTION; ARTICLE; CRYSTAL; CRYSTAL STRUCTURE; EVAPORATION; FILM; GRAVIMETRY; HYDROLYSIS; LOW TEMPERATURE PROCEDURES; MICROGRAVITY; PRIORITY JOURNAL; SPECTROSCOPY; THERMODYNAMICS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0345357153     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2003.07.013     Document Type: Article

References (35)

1. Hannink R.H.J., Kelly P.M., Muddle B.C. J. Am. Ceram. Soc. 83:2000;461.
2. Hu M.Z.C., Hunt R.D., Payzant E.A., Hubbard C.R. J. Am. Ceram. Soc. 82:1999;2313.
3. Birkby I., Stevens R. Key Eng. Mater. 122:1996;527.
4. Minh N.Q. J. Am. Ceram. Soc. 76:1993;563.
5. Copel M., Gribelyuk M., Gusev E. Appl. Phys. Lett. 76:2000;436.
6. Xie Y. J. Am. Ceram. Soc. 82:1999;768.
7. Yamaguchi T. Catal. Today. 20:1994;199.
8. Corma A. Chem. Rev. 95:1995;559.
9. French R.H., Glass S.J., Ohuchi F.S., Xu Y.N., Ching W.Y. Phys. Rev. B. 49:1994;5133.
10. Soriano L., Abbate M., Faber J., Morant C., Sanz J.M. Solid State Commun. 93:1995;659.
11. Scanlan C.M., Gajdardziska-Josifovska M., Aita C.R. Appl. Phys. Lett. 64:1994;3548.
12. Jeon T.S., White J.M., Kwong D.L. Appl. Phys. Lett. 78:2001;368.
13. Agarwal M., De Guire M.R., Heuer A.H. J. Am. Ceram. Soc. 80:1997;2967.
14. Kotov N.A., Zavala G., Fendler J.H. J. Phys. Chem. 99:1995;12375.
15. Nakaya T., Li Y.-J., Shibata K. J. Mater. Chem. 6:1996;691.
16. Meldrum F.C., Kotov N.A., Fendler J.H. J. Phys. Chem. 98:1994;4506.
17. Yang J., Peng X.-G., Zhang Y., Wang H., Li T.-J. J. Phys. Chem. 97:1993;4484.
18. Cao L., Huo L., Ping G., Wang D., Zeng G., Xi S. Thin Solid Films. 347:1999;258.
19. Muramatsu K., Takahashi M., Tajima K., Kobayashi K. J. Colloid Interface Sci. 242:2001;127.
20. Lee D.K., Kang Y.S., Lee C.S., Stroeve P. J. Phys. Chem. B. 106:2002;7267.
21. Furlong D.N., Urquhart R.S., Grieser F., Matsuura K., Okahata Y. J. Chem. Soc. Chem. Commun. 1995;1329.
22. Paranjape D.V., Sastry M., Ganguly P. Appl. Phys. Lett. 63:1993;18.
23. Amm D.T., Johnson D., Laursen T., Gupta S.K. Appl. Phys. Lett. 61:1992;522.
24. Taylor D.M., Lambi J.N. Thin Solid Films. 243:1994;384.
25. Seidl M., Schurr M., Brugger A., Volz E., Voit H. Appl. Phys. A. 68:1999;81.
26. Amm D.T., Johnson D.J., Matsuura N., Laursen T., Palmer G. Thin Solid Films. 242:1994;74.
27. Ganguly P., Sastry M., Pal S., Shashikala M.N. Langmuir. 11:1995;1078.
28. Mandal S., Sainkar S.R., Sastry M. Nanotechnology. 12:2001;358.
29. Mandal S., Sastry M. Mater. Res. Bull. 37:2002;1613.
30. Mandal S., Damle C., Sainkar S.R., Sastry M. J. Nanosci. Nanotechnol. 1:2001;281.
31. Sastry M., Rao M., Ganesh K.N. Acc. Chem. Res. 35:2002;847. and references therein.
32. Sauerbrey G. Z. Phys. 155:1959;206.
33. Lopez E.F., Escribano V.S., Panizza M., Carnascialic M.M., Busca G. J. Mater. Chem. 11:2001;1891.
34. Valov I., Stoychev D., Marinova Ts. Electrochim. Acta. 47:2002;4419.
35. Woudenberg F.C.M., Sager W.F.C., Sibelt N.G.M., Verweij H. Adv. Mater. 13:2001;514.