Interaction of metals and barrier layers with fluorinated silicon oxides

Solid-State Electronics

Volumn 43, Issue 6, 1999, Pages 1019-1023

  Kim, Sarah E ^a   Steinbrüchel, Christoph ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLUORINE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; SILICA; X RAY PHOTOELECTRON SPECTROSCOPY;

FLUORINATED SILICON OXIDE; NUCLEAR REACTION ANALYSIS (NRA);

SEMICONDUCTING FILMS;

EID: 0344286596     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(99)00018-0     Document Type: Article

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