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Chemical Vapor Deposition

Volumn 4, Issue 6, 1998, Pages 213-216

Halide Chemical Vapor Deposition of Bi4Ti3O12

(2) Schuisky, Mikael a Hårsta, Anders a

a UPPSALA UNIVERSITY (Sweden)

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EID: 0003822644 PISSN: 09481907 EISSN: None Source Type: Journal
DOI: 10.1002/(sici)1521-3862(199812)04:06<213::aid-cvde213>3.3.co;2-y Document Type: Article

Times cited : (10)

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