메뉴 건너뛰기




Volumn 83, Issue 1, 2000, Pages 93-100

Low-cost post-CMOS integration of electroplated microstructures for inertial sensing

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATION; CMOS INTEGRATED CIRCUITS; ELECTRONICS PACKAGING; ELECTROPLATING; MICROELECTROMECHANICAL DEVICES; MICROSTRUCTURE; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR SWITCHES;

EID: 0343341656     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(00)00295-8     Document Type: Article
Times cited : (62)

References (8)
  • 4
    • 0032092691 scopus 로고    scopus 로고
    • Dry release of metal structures in oxygen plasma: Process characterization and optimization
    • Bartek M., Wolffenbuttel R.F. Dry release of metal structures in oxygen plasma: process characterization and optimization. J. Micromech. Microeng. 8:1998;91-94.
    • (1998) J. Micromech. Microeng. , vol.8 , pp. 91-94
    • Bartek, M.1    Wolffenbuttel, R.F.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.