Characterization of CuCl nanocrystals in SiO2 matrix fabricated by inductively coupled plasma-assisted sputtering deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 5, 2003, Pages 2169-2173

  Kurisu, Hiroki ^a   Nagoya, Kazutaka ^a   Yamada, Naoko ^a   Yamamoto, Setsuo ^a   Matsuura, Mitsuru ^a  

^a YAMAGUCHI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; AMORPHOUS MATERIALS; CRYSTALLIZATION; EXCITONS; INDUCTIVELY COUPLED PLASMA; LUMINESCENCE; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; SILICA; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY;

COPPER CHLORIDE; CRYSTAL CHARACTERISTICS; DIFFRACTION SPOTS; GLASS MATRIX;

COPPER COMPOUNDS;

EID: 0242593749     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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