Ionized physical vapor deposition of Cu using a mixture of rare gases

Journal of Applied Physics

Volumn 89, Issue 5, 2001, Pages 2535-2538

  Rauf, Shahid ^a   Ventzek, Peter L G ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042089841     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1345520     Document Type: Article

References (10)

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