Optical properties of Si nanocrystals prepared by magnetron sputtering

Applied Physics Letters

Volumn 69, Issue 27, 1996, Pages 4148-4150

  Baru, V G ^a   Chernushich, A P ^a   Luzanov, V A ^a   Stepanov, G V ^a   Zakharov, L Yu ^a   O'Donnell, K P ^b   Bradley, I V ^b   Melnik, N N ^c  

^a INST OF RADIO ENG AND ELECTRONICS   (Russian Federation)

^b UNIVERSITY OF STRATHCLYDE   (United Kingdom)

^c LEBEDEV PHYSICAL INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; FILM PREPARATION; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; RAMAN SCATTERING; SEMICONDUCTING SILICON; SILICA; THIN FILMS; VACUUM;

NANOCRYSTALS; VISIBLE PHOTOLUMINESCENCE;

OPTICAL PROPERTIES;

EID: 0030411058     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116967     Document Type: Article

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