A surface micromachining process for suspended RF-MEMS applications using porous silicon

Microsystem Technologies

Volumn 9, Issue 6-7, 2003, Pages 470-473

  Ding, Y ^a   Liu, Z ^a   Liu, L ^a   Li, Z ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; MICROELECTROMECHANICAL DEVICES; POROUS SILICON; SCANNING ELECTRON MICROSCOPY; SPUTTERING; SURFACE PHENOMENA; THICKNESS MEASUREMENT;

ELECTROCHEMICAL ETCHING;

MICROMACHINING;

EID: 0242495713     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-002-0266-7     Document Type: Article

References (10)

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