Robust mask-layout and process synthesis

Journal of Microelectromechanical Systems

Volumn 12, Issue 5, 2003, Pages 728-739

  Ma, Lin ^a   Antonsson, Erik K ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Bulk wet etching; Design; Genetic algorithm MEMS; Synthesis

Indexed keywords

COMPUTER SIMULATION; ETCHING; GENETIC ALGORITHMS; MASKS; MICROELECTRONIC PROCESSING; SEMICONDUCTOR DEVICE MANUFACTURE;

AUTOMATED SYNTHESIS TOOL; BULK WET ETCHING; ROBUST MASK LAYOUT;

MICROELECTROMECHANICAL DEVICES;

EID: 0242468195     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2003.815830     Document Type: Article

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