메뉴 건너뛰기




Volumn 48, Issue 2, 2004, Pages 217-223

A Weibull distribution-based new approach to represent hot carrier degradation in threshold voltage of MOS transistors

Author keywords

Hot carriers; Measurement and evaluation; Modeling and simulation of solid state devices and processes; MOS transistors; Weibull distribution

Indexed keywords

COMPUTER SIMULATION; DIELECTRIC MATERIALS; HOT CARRIERS; SOLID STATE DEVICES; THRESHOLD VOLTAGE; TRANSISTORS; VLSI CIRCUITS; WEIBULL DISTRIBUTION;

EID: 0242335149     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2003.07.001     Document Type: Article
Times cited : (20)

References (33)
  • 1
    • 0034197708 scopus 로고    scopus 로고
    • Fitting the Weibull log-linear model to accelerated life-test data
    • Wang W., Kececioglu D.B. Fitting the Weibull log-linear model to accelerated life-test data. IEEE Trans. Reliab. 49(2):2000;217-223.
    • (2000) IEEE Trans. Reliab. , vol.49 , Issue.2 , pp. 217-223
    • Wang, W.1    Kececioglu, D.B.2
  • 2
    • 0028511706 scopus 로고
    • Review: Likehood method for fitting Weibull log-linear models to accelerated life-test data
    • Watkins A.J. Review: likehood method for fitting Weibull log-linear models to accelerated life-test data. IEEE Trans. Reliab. 49(3):1994;361-365.
    • (1994) IEEE Trans. Reliab. , vol.49 , Issue.3 , pp. 361-365
    • Watkins, A.J.1
  • 3
    • 0028195601 scopus 로고
    • A classification rule arising from accelerated life tests
    • Tseng S.T., Chyau C.H. A classification rule arising from accelerated life tests. Reliab. Eng. Syst. Safety. 43:1994;247-256.
    • (1994) Reliab. Eng. Syst. Safety , vol.43 , pp. 247-256
    • Tseng, S.T.1    Chyau, C.H.2
  • 4
    • 0028444829 scopus 로고
    • Perspective on Weibull proportional-hazard models
    • Newby M. Perspective on Weibull proportional-hazard models. IEEE Trans. Reliab. 43(2):1994;217-223.
    • (1994) IEEE Trans. Reliab. , vol.43 , Issue.2 , pp. 217-223
    • Newby, M.1
  • 6
    • 0032663537 scopus 로고    scopus 로고
    • Estimation of the stress-threshold for the Weibull inverse power law
    • Hagwood C., Clough R., Fields R. Estimation of the stress-threshold for the Weibull inverse power law. IEEE Trans. Reliab. 48(2):1999;176-181.
    • (1999) IEEE Trans. Reliab. , vol.48 , Issue.2 , pp. 176-181
    • Hagwood, C.1    Clough, R.2    Fields, R.3
  • 7
    • 0000805307 scopus 로고    scopus 로고
    • Weibull breakdown characteristics and oxide thickness uniformity
    • Wu E.Y., Nowak E.J., Vollersten R.P., Han L.-K. Weibull breakdown characteristics and oxide thickness uniformity. IEEE Trans. Electron. Dev. 47(12):2000;2301-2309.
    • (2000) IEEE Trans. Electron. Dev. , vol.47 , Issue.12 , pp. 2301-2309
    • Wu, E.Y.1    Nowak, E.J.2    Vollersten, R.P.3    Han, L.-K.4
  • 8
    • 0033326798 scopus 로고    scopus 로고
    • Comparing linear regression and maximum likelihood methods to estimate Weibull distributions on limited data sets: Systematic and random errors'
    • Ross R. Comparing linear regression and maximum likelihood methods to estimate Weibull distributions on limited data sets: systematic and random errors'. In: Conference on Electrical Insulation and Dielectric Phenomena; 1999. p. 170-3.
    • (1999) Conference on Electrical Insulation and Dielectric Phenomena , pp. 170-173
    • Ross, R.1
  • 9
    • 0242327547 scopus 로고    scopus 로고
    • Microelectronic failure analysis
    • Ross R., Boit C. Microelectronic failure analysis. ASM Int. 1999.
    • (1999) ASM Int.
    • Ross, R.1    Boit, C.2
  • 11
    • 0242358921 scopus 로고    scopus 로고
    • Gate oxide thickness effects on hot-carrier-induced degradation in n-MOSFET's
    • 1.19
    • Gu Y., Yuan J.S. Gate oxide thickness effects on hot-carrier-induced degradation in. n-MOSFET's Int. J. Electron. 85(1.19):1998.
    • (1998) Int. J. Electron. , vol.85
    • Gu, Y.1    Yuan, J.S.2
  • 15
    • 0027642134 scopus 로고
    • Hot carrier stress effect in p-MOSFETs: Physical effects relevant for circuit operation
    • Weber W., Brox M., Schwerin A.V., Thewes R. Hot carrier stress effect in p-MOSFETs: physical effects relevant for circuit operation. Microelectron Eng. 22:1993;253-260.
    • (1993) Microelectron Eng , vol.22 , pp. 253-260
    • Weber, W.1    Brox, M.2    Schwerin, A.V.3    Thewes, R.4
  • 16
    • 0242358920 scopus 로고
    • A physical-based analytical model for the hot carrier induced saturation current degradation of p-MOSFETs
    • Pan Y. A physical-based analytical model for the hot carrier induced saturation current degradation of. p-MOSFETs IEEE Trans. Electron. Dev. 41(1):1994;84-89.
    • (1994) IEEE Trans. Electron. Dev. , vol.41 , Issue.1 , pp. 84-89
    • Pan, Y.1
  • 19
    • 0030194271 scopus 로고    scopus 로고
    • Modelling of hot carrier stressed characteristic of submicrometer p-MOSFETs
    • Jang S.L., Tang T.H., Chen Y.S., Sheu C.J. Modelling of hot carrier stressed characteristic of submicrometer. p-MOSFETs Solid State Electron. 2:1996;1043-1047.
    • (1996) Solid State Electron. , vol.2 , pp. 1043-1047
    • Jang, S.L.1    Tang, T.H.2    Chen, Y.S.3    Sheu, C.J.4
  • 20
    • 84954124396 scopus 로고
    • A phyiscal lifetime prediction method for hot carrier stressed p-MOS transistors
    • Brox M., Wohlrab E., Weber W. A phyiscal lifetime prediction method for hot carrier stressed. p-MOS transistors IEDM Tech. Dig. 2:1991;525-528.
    • (1991) IEDM Tech. Dig. , vol.2 , pp. 525-528
    • Brox, M.1    Wohlrab, E.2    Weber, W.3
  • 21
    • 84944376932 scopus 로고
    • A new bi-directional p-MOSFET hot carrier degradation model for circuit reliability simulation
    • Li C.C., Quader K.N., Minami E.R., Hu C., Ko P.K. A new bi-directional. p-MOSFET hot carrier degradation model for circuit reliability simulation IEDM Tech. Dig. 1992;547-550.
    • (1992) IEDM Tech. Dig. , pp. 547-550
    • Li, C.C.1    Quader, K.N.2    Minami, E.R.3    Hu, C.4    Ko, P.K.5
  • 22
    • 0024124856 scopus 로고    scopus 로고
    • Consistent model for the hot carrier degradation in n-channel and p-channel MOSFETs
    • Heramans P., Bellens R., Groeseneken G., Meas H.E. Consistent model for the hot carrier degradation in n-channel and p-channel MOSFETs. IEEE Trans. Electron. Dev. 1998;2194-2209.
    • (1998) IEEE Trans. Electron. Dev. , pp. 2194-2209
    • Heramans, P.1    Bellens, R.2    Groeseneken, G.3    Meas, H.E.4
  • 25
    • 0242358921 scopus 로고    scopus 로고
    • Gate-oxide thickness effects on hot-carrier-induced degradation in n-MOSFETs
    • Gu Y., Yuan J.S. Gate-oxide thickness effects on hot-carrier-induced degradation in n-MOSFETs. Int. J. Electron. 85(1):1998;1-9.
    • (1998) Int. J. Electron. , vol.85 , Issue.1 , pp. 1-9
    • Gu, Y.1    Yuan, J.S.2
  • 28
    • 24444446920 scopus 로고    scopus 로고
    • A simple approach for modeling the influence of hot-carriers on threshold voltage of MOS transistors
    • Kaçar F., Kuntman A., Kuntman H. A simple approach for modeling the influence of hot-carriers on threshold voltage of MOS transistors. J. Electr. Electron., Eng. Facul. Istanbul Univer. 1(2):2001;201-208.
    • (2001) J. Electr. Electron., Eng. Facul. Istanbul Univer. , vol.1 , Issue.2 , pp. 201-208
    • Kaçar, F.1    Kuntman, A.2    Kuntman, H.3
  • 32
    • 0029255085 scopus 로고
    • New MOSFET model suitable for analogue IC analysis
    • Zeki̇ A., Kuntman H. New MOSFET model suitable for analogue IC analysis. Int. J. Electron. 78(2):1995;247-260.
    • (1995) Int. J. Electron. , vol.78 , Issue.2 , pp. 247-260
    • Zeki, A.1    Kuntman, H.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.