A new approach of E-beam proximity effect correction for high-resolution applications

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12 B, 1998, Pages 6774-6778

  Simecek, Michal ^a   Rosenbusch, Anja ^a   Ohta, Tsuneaki ^b   Jinbo, Hideyuki ^a  

^a Sigma C GmbH   (Germany)

^b OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

Dose variation; E beam proximity effect correction; Forward scattering; High resolution; Shape variation

Indexed keywords

EID: 0006682703     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6774     Document Type: Article

References (8)

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4. CAPROX is a trademark of Sigma-C GmbH.
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6. U. Hofmann, C. K. Kalus, A. Rosenbusch, H. Endo, Y. Kimura and A. Endo: BACUS, Sept. 95.
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8. SELID is a trademark of Sigma-C GmbH.