Influence of ion energy on the surface morphology of tetrahedral amorphous carbon films

Journal of Materials Science Letters

Volumn 17, Issue 4, 1998, Pages 335-337

  Chen, Z Y ^a   Zhao, J P ^a   Yu, Y H ^a   Wang, X ^a   Yang, S Q ^a   Shi, T S ^a   Liu, X H ^a   Luo, E Z ^b   Xu, J B ^b   Wilson, I H ^b  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON; DEPOSITION; IONIZATION OF SOLIDS; IONS; MAGNETOPLASMA; SILICON WAFERS; SINGLE CRYSTALS; SURFACE ROUGHNESS;

FILTERED ARC DEPOSITION (FAD); ION ENERGY;

AMORPHOUS FILMS;

EID: 0031997463     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1006502210376     Document Type: Article

References (6)

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