Stress control of sputter-deposited Mo-N films for micromechanical applications

Microelectronic Engineering

Volumn 60, Issue 1-2, 2002, Pages 97-105

  Kattelus, H ^a   Koskenala, J ^a   Nurmela, A ^a   Niskanen, A ^b  

^a VTT TECHNICAL RESEARCH CENTRE OF FINLAND   (Finland)

^b UNIVERSITY OF HELSINKI   (Finland)

Author keywords

Amorphous metal; Mechanical properties; Metal micromachining; Micromechanics; Molybdenum nitride; Stress

Indexed keywords

COMPOSITE MICROMECHANICS; CRYSTALLINE MATERIALS; MICROMACHINING; MOLYBDENUM COMPOUNDS; SPUTTER DEPOSITION; STRESS ANALYSIS; THIN FILMS;

MICROCRYSTALLINE STRUCTURES; MICROMECHANICAL BEAMS;

METALLIC FILMS;

EID: 0036132942     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00585-8     Document Type: Conference Paper

References (11)