Crystal Structure Analysis of Metalorganic Chemical Vapor Deposition-β-FeSi2 Thin Film by X-ray Diffraction Measurement

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 8, 2003, Pages 4943-4948

  Kimura, Takeshi ^a   Akiyama, Kensuke ^b   Watanabe, Takayuki ^a   Saito, Keisuke ^c   Funakubo, Hiroshi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^c PANalytical   (Japan)

Author keywords

MOCVD; XRD; FeSi2 thin film

Indexed keywords

CRYSTAL STRUCTURE; IRON COMPOUNDS; LATTICE CONSTANTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS;

VOLUME FRACTION RATIOS;

THIN FILMS;

EID: 0142107419     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.4943     Document Type: Article

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